Preparation of Pb(Zr, Ti)O3 thin films sputtered from a multi-element metallic target
Nguyen, Thanh Huy Vu, Ngoc Hung Nguyen, Phu Thuy PZT thin films have been grown on Pt/Ti/Si02/Si substrates by the reactive RF-magnetron sputtering deposition method using a multi-element metallic target. The AB03 perovskite structure in the thin films sputtered at a substrate temperature of 250 °c was formed through various intermediate phases by annealing at 650 °c for 1 hour in the air or an oxygen gas ambience. The film compositions were estimated by Electron Probe Micro-Analyzer (EPMA). The surface morphology observed by Atomic Force Microscopy (AFM) showed a densely packed grain structure with no rosettes structure. The remanent polarization value of the thin film with a thickness of 500 nm was 1.37 nC/cm . Chi tiết xin mời tham khảo tại http://repository.vnu.edu.vn/handle/VNU_123/57890 Title: Preparation of Pb(Zr, Ti)O3 thin films sputtered from a multi-element metallic target Authors: Nguyen, Thanh Huy Vu, Ngoc Hung Nguyen, Phu Thuy Keywords: Pb(...